A user guide to ellipsometry pdf download




















Authors: Harland G. Tompkins, William A. While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and optical properties of thin films. This book provides the first practical introduction to spectroscopic ellipsometry and the related techniques of reflectometry. A guide for practitioners and researchers. A Practical Guide to Surface Metrology.

This book offers a genuinely practical introduction to the most commonly encountered optical and non-optical systems used for the metrology and characterization of surfaces, including guidance on best practice, calibration, advantages and disadvantages, and interpretation of results.

It enables the user to select the best approach in a given context. Nondestructive Materials Characterization. Authors: Norbert G. Meyendorf, Peter B. Ellipsometry is also becoming more interesting to researchers in other disciplines such as biology and medicine. In the semiconductor industry, there is continuous demand for higher performance and denser integrated circuits. These requirements push the advancement of technology which requires solving of manufacturing challenges.

A key to success is to understand the chemical, mechanical and physical properties of wide range of materials used in a typical integrated circuit. The applied measurement technique for obtaining these parameters in a high accuracy and repeatable way is spectroscopic ellipsometry.

Ellipsometry measures the phase of the reflected light from the sample, therefore it is relatively insensitive for intensity fluctuations. Built on 25 years of experience, the UVISEL phase modulated ellipsometer delivers high precision and high resolution measurements, with the best signal to noise ratio, ideal for research on nano and micro scale structures. A large array of options and accessories offers enhanced performance and versatility.

Using the adaptation kit, it is possible to easily switch between in-situ and ex-situ configurations and experiment with new applications. For the demanding needs of flexible electronic devices, flexible displays and flexible solar panels, the UVISEL In-Line is fully compatible with roll-to-roll processing. The setting of the goniometer angle can be selected to best fit with your applications. The stage can accommodate samples up to mm in size, with substrate thickness up to 17 mm. The largest variety of data acquisition and modeling functions gives research engineers the full performance of ellipsometric analysis.

While single wave ellipsometry has been around for years, spectroscopic ellipsometry is fast becoming the method of choice for measuring the thickness and. Skip to search form Skip to main content You are currently offline. Some features of the site may not work correctly.



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